Decomposition of CH3Cl/CO2 mixtures by using an RF plasma reactor

Journal of Aerosol Science

Volumn 28, Issue SUPPL. 1, 1997, Pages

  Hsieh, Lien Te ^a   Lee, Wen Jhy ^a   Chen, Chun Yung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

CH3Cl; Decomposition; FTIR; Plasma; RF

Indexed keywords

EID: 0040565167     PISSN: 00218502     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0021-8502(97)85259-7     Document Type: Article

References (2)

1. 2 Contained Gas in an RF Plasma Reactor, J. Hazar. Materials, 48, 51-67.
2. 2 Decomposition by Using a Radio-Frequency Plasma system, J. Chem. Tech. Biotechnol., 66, 382-388.