Ex situ wafer surface cleaning by HF dipping for low temperature silicon epitaxy

Thin Solid Films

Volumn 305, Issue 1-2, 1997, Pages 280-285

  Kim, Hyoun Woo ^a   Reif, Rafael ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Epitaxy; Silicon; Surface and interface states; Transmission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; EPITAXIAL GROWTH; HYDROFLUORIC ACID; INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; SURFACE CLEANING; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); DIPPING; MULTI CHAMBER CHEMICAL VAPOR DEPOSITION (MCCVD);

SILICON WAFERS;

EID: 0040564650     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00122-3     Document Type: Article

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