Plasma oxidation of silicon

Plasma Physics

Volumn 24, Issue 6, 1982, Pages 605-614

  Moruzzi, J L ^a   Kiermasz, A ^a   Eccleston, W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040559259     PISSN: 00321028     EISSN: None     Source Type: Journal    
DOI: 10.1088/0032-1028/24/6/003     Document Type: Article

References (14)

1. Plasma Anodization of Metals and Semiconductors
2. A study of the reactions of the ground and metastable states of C+, N+, S+ and N2+ at 300 K