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Volumn 53, Issue 12, 1999, Pages 682-685

Aerosol chemical reduction plating

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0040532122     PISSN: 00260746     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (16)
  • 3
    • 84953864603 scopus 로고
    • Electroless deposition processes: Fundamentals and applications
    • Edited by H. Gerisher & C.W. Tobias, VCH Publishers Inc., Weinheim & New York
    • Y. Okinaka, T. Osaka: "Electroless deposition processes: Fundamentals and Applications", Advances in Electrochemical Science and Engineering, Vol. 3, Edited by H. Gerisher & C.W. Tobias, VCH Publishers Inc., Weinheim & New York, 1994.
    • (1994) Advances in Electrochemical Science and Engineering , vol.3
    • Okinaka, Y.1    Osaka, T.2
  • 6
    • 0040382928 scopus 로고
    • J. A. Lauchet: Surfaces, 1984, 164, N° 3, p. 42
    • (1984) Surfaces , vol.164 , Issue.3 , pp. 42
    • Lauchet, J.A.1
  • 13
    • 0040977156 scopus 로고    scopus 로고
    • Metallising of plastics using a dynamic chemical plating process
    • Edited by K.L.Mittal, VSP Inc. Pub., Utrecht, The Netherlands
    • A. Fares Karam, G. Stremsdoerfer: "Metallising of plastics using a Dynamic Chemical Plating process", Metallized Plastics V&VI, p. 137, Edited by K.L.Mittal, VSP Inc. Pub., Utrecht, The Netherlands, 1998
    • (1998) Metallized Plastics V&VI , pp. 137
    • Fares Karam, A.1    Stremsdoerfer, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.