Segregation and transport coefficients of impurities at the Si/SiO 2 interface

Journal of Applied Physics

Volumn 61, Issue 4, 1987, Pages 1553-1555

  Sakamoto, K ^a   Nishi, K ^a   Ichikawa, F ^a   Ushio, S ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

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[No Author keywords available]

Indexed keywords

EID: 0040394637     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.338089     Document Type: Article

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