Dispersive transport of holes in porous silicon

Semiconductors

Volumn 30, Issue 11, 1996, Pages 1099-1100

  Lebedev, E A ^a   Polisskii G ^b   Petrova Koch, V ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040304849     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

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