Predicting the crystallization temperature variation with composition for amorphous silicon-based binary alloy thin films

Journal of Applied Physics

Volumn 81, Issue 3, 1997, Pages 1150-1156

  Carlsson, J R A ^a,b   Sundgren, J E ^a   Li, X H ^a,c   Madsen, L D ^a   Hentzell, H T G ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c ABB CORPORATE RESEARCH   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040285431     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363860     Document Type: Article

References (49)

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