Mechanisms for O2 dissociation during pulsed-laser ablation and deposition

Applied Physics Letters

Volumn 78, Issue 16, 2001, Pages 2402-2404

  Camposeo, A ^a   Cervelli, F ^a   Fuso, F ^a   Allegrini, M ^a   Arimondo, E ^a  

^a UNIVERSITY OF PISA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040156339     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1366363     Document Type: Article

References (17)

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