Plasma oxidation of Cu, Ti and Ni and the photoelectrochemical properties of the oxide layers formed

Materials Chemistry and Physics

Volumn 43, Issue 3, 1996, Pages 283-286

  Masui, Masayoshi ^a   Muranoi, Tetsuo ^a   Urao, Ryoichi ^a   Momose, Yoshihiro ^a   Islam, Mohammed Rafiqul ^a   Takeuchi, Manabu ^a  

^a IBARAKI UNIVERSITY   (Japan)

Author keywords

Anodic potentials; Plasmas; Semiconductor electrodes

Indexed keywords

EID: 0040153517     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/0254-0584(95)01631-4     Document Type: Article

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