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1
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22244461274
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For a review see Physics of Quantum Electron Devices, edited by F. Capasso (Springer, New York, 1990)
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For a review see Physics of Quantum Electron Devices, edited by F. Capasso (Springer, New York, 1990).
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2
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77956949383
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See e.g. H. C. Liu and T. C. L. G. Sollner, Semicond. Semimet. 41, 359 (1994)
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See e.g. H. C. Liu and T. C. L. G. Sollner, Semicond. Semimet. 41, 359 (1994).
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3
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0001696967
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M. A. Reed, J. N. Randall, R. J. Aggarwal, R. J. Matyi, T. M. Moore, and A. E. Wetsel, Phys. Rev. Lett. 60, 535 (1988).
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Phys. Rev. Lett.
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Reed, M.A.1
Randall, J.N.2
Aggarwal, R.J.3
Matyi, R.J.4
Moore, T.M.5
Wetsel, A.E.6
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4
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0342834994
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M. Tewordt, V. J. Law, M. J. Kelly, R. Newbury, M. Pepper, D. C. Peacock, J. E. F. Frost, D. A. Ritchie, and G. A. C. Jones, J. Phys. Condens. Matt. 2, 8969 (1990).
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J. Phys. Condens. Matt.
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Tewordt, M.1
Law, V.J.2
Kelly, M.J.3
Newbury, R.4
Pepper, M.5
Peacock, D.C.6
Frost, J.E.F.7
Ritchie, D.A.8
Jones, G.A.C.9
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6
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33847391809
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T. Schmidt, M. Tewordt, R. H. Blick, R. J. Haug, D. Pfannkuche, K. v. Klitzing, A. Förster, and H. Lüth, Phys. Rev. B 51, 5570 (1995).
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(1995)
Phys. Rev. B
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Schmidt, T.1
Tewordt, M.2
Blick, R.H.3
Haug, R.J.4
Pfannkuche, D.5
K, V.K.6
Förster, A.7
Lüth, H.8
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7
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22244432590
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A. Zaslavsky, V. J. Goldman, D. C. Tsui, and J. E. Cunningham, Appl. Phys. Lett. 53, 1228 (1988).
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Appl. Phys. Lett.
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Zaslavsky, A.1
Goldman, V.J.2
Tsui, D.C.3
Cunningham, J.E.4
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8
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22244472377
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An increasing emitter-barrier thickness reduces the peak voltage because a growing part of the applied bias drops between the emitter contact and the quantum well, i.e. the subband in the quantum well is shifted to lower energy at a given bias. This is however a minor effect in our case since the variation of the emitter-barrier thickness is small compared to the length of the undoped device region across which the applied bias drops
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An increasing emitter-barrier thickness reduces the peak voltage because a growing part of the applied bias drops between the emitter contact and the quantum well, i.e. the subband in the quantum well is shifted to lower energy at a given bias. This is however a minor effect in our case since the variation of the emitter-barrier thickness is small compared to the length of the undoped device region across which the applied bias drops.
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10
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22244460585
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Hopping through possible mid-band-gap surface defects at the Fermi level would also decrease the peak-to-valley ratio. Such a parallel current path would be especially relevant for positive bias because of the lower overall current density compared to negative bias [see Figs. 2 (a) and (b)]. However, the presence of significant defect-related currents is not likely as we observe no Ohmic contribution in the current valleys in Fig. 2 (b)
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Hopping through possible mid-band-gap surface defects at the Fermi level would also decrease the peak-to-valley ratio. Such a parallel current path would be especially relevant for positive bias because of the lower overall current density compared to negative bias [see Figs. 2 (a) and (b)]. However, the presence of significant defect-related currents is not likely as we observe no Ohmic contribution in the current valleys in Fig. 2 (b).
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