Analysis of the x-ray photoelectron spectra of a-SiOCF films prepared by plasma-enhanced chemical vapour deposition

Chinese Physics

Volumn 10, Issue 4, 2001, Pages 324-328

  Ding, Shi Jin ^a   Wang, Peng Fei ^a   Zhang, Wei ^a   Wang, Ji Tao ^c   Wei, William Lee ^b  

^a FUDAN UNIVERSITY   (China)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^c NONE

Author keywords

a SiOCF film; Plasma enhanced chemical vapour deposition; X ray photoelectron spectrum

Indexed keywords

BINDING ENERGY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

A-SIOCF FILM; PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION; X-RAY PHOTOELECTRON SPECTRA;

SEMICONDUCTING FILMS;

EID: 0039840534     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/10/4/312     Document Type: Article

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