Modeling of mass and energy transport in H2 plasma obtained under diamond deposition discharge conditions

Journal of Wide Bandgap Materials

Volumn 5, Issue 1, 1996, Pages 38-48

  Hassouni, K ^a   Farhat, S ^a   Scott, C D ^a,b   Gicquel, A ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b NASA JOHNSON SPACE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; CHEMICAL REACTIONS; ENERGY DISSIPATION; HYDROGEN; PLASMAS; THERMODYNAMICS;

DIAMOND DEPOSITION DISCHARGE CONDITIONS; ENERGY TRANSPORT; HYDROGEN PLASMA; MICROWAVE POWER DENSITY (MWP);

DIAMOND DEPOSITS;

EID: 0039615543     PISSN: 1524511X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. Scott, C. D., S. Farhat, A. Gicqual and K. Hassouni. 1996. "Determining Electron Temperature and Density in a Hydrogen Microwave Plasma," Journal of Thermophysics and Heat Transfer, 10:426.
2. 2 Plasma Obtained under Diamond Deposition Discharge Conditions," to be published in Handbook for Industrial Diamonds and Diamond Films, M. Prelas, G. Popovicci and K. Bigelow, eds.
3. Gicquel, A., E. Anger, M.-F. Ravet, D. Fahre, G. Scatena and Z.-Z. Wang. 1993. "Diamond Deposition in a Bell Jar Reactor: Influence of the Plasma and the Substrate Parameters on the Microstructure and the Growth Rate," Diam. and Rel. Mat., 2:417-424.
4. Gicquel, A., K. Hassouni, S. Farhat, Y. Breton, C. D. Scott, M. Lefebvre and M. Péalat. 1994. "Spectroscopic Analysis and Chemical Kinetics Modeling of a Diamond Deposition Plasma Reactor," Diamond and Related Materials, 3:581-586.
5. Nishida, M. 1972. "Non Equilibrium Viscous Shock Layer in a Partially Ionized Gas," Phys. Fluids, 15:4.
6. Goodwin, D. G. 1993. "Scaling Laws for Diamond Chemical-Vapor Deposition. II. Atomic Hydrogen Transport," J. Appl. Phys., 74(11):6895-6906.