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Volumn 30, Issue 10, 1996, Pages 990-991

Defect accumulation in Si due to systematic bombardment by argon and nitrogen ions (molecular effect)

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[No Author keywords available]

Indexed keywords


EID: 0039613742     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (2)

References (12)
  • 5
    • 0040997569 scopus 로고
    • I. A. Abroyan, L. M. Nikulina, and A. I. Titov, Fiz. Tekh. Poluprovodn. 19, 1030 (1985) [Sov. Phys. Semicond. 19, 632 (1985)].
    • (1985) Sov. Phys. Semicond. , vol.19 , pp. 632


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.