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Volumn 30, Issue 10, 1996, Pages 990-991
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Defect accumulation in Si due to systematic bombardment by argon and nitrogen ions (molecular effect)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0039613742
PISSN: 10637826
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (2)
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References (12)
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