Extreme ultraviolet lithography at Carl Zeiss: Manufacturing and metrology of aspheric surfaces with angstrom accuracy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2975-2977

  Handschuh, H ^a   Froschke J ^a   Julich M ^a   Mayer, M ^a   Weiser, M ^a   Seitz, G ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039523294     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590937     Document Type: Article

References (6)

1. U. Dinger (private communication).
2. D. Tichenor et al., Proc. SPIE 2-437, 292 (1995).
3. M. Küchel, Proc. SPIE 1332, 655 (1990).
4. K. Creath and J. C. Wyant, Proc. SPIE 1332, 2 (1990).
5. Kestner, in Extreme Ultraviolet Lithography, OSA Tech. Dig. (Optical Society of America, Washington, DC, 1996).
6. L. N. Allen et al., Proc. SPIE 1531, 195 (1992).