Doping efficiency and plasma analysis of a nitrogen electron cyclotron resonance plasma

Journal of Crystal Growth

Volumn 159, Issue 1-4, 1996, Pages 284-288

  Grun M ^a,b   Sadeghi, N ^a   Cibert, J ^a   Genuist, Y ^a   Tserepi, A ^a  

^a UNIV GRENOBLE ALPES   (France)

^b UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ELECTRON CYCLOTRON RESONANCE; EMISSION SPECTROSCOPY; IONS; MASS SPECTROMETRY; MOLECULAR BEAM EPITAXY; MOLECULES; NITROGEN; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DOPING;

ATOM CONCENTRATION; DOPING EFFICIENCY; MASS SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; PLASMA ANALYSIS;

PLASMA SOURCES;

EID: 0039468543     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(95)00763-6     Document Type: Article

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