Non-uniform SiO2 membranes produced by ion beam-assisted chemical vapor deposition to tune WO3 gas sensor microarrays

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 292-296

  Goschnick, J ^a   Frietsch, M ^a   Schneider, T ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Ion beam assisted chemical vapor deposition; Membrane; Metal oxide gas sensors; Microarray

Indexed keywords

CERAMIC COATINGS; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ION BEAMS; MASS SPECTROMETRY; SILICA; TUNGSTEN COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION-BEAM ASSISTED DEPOSITION (IBAD); MICROARRAYS; SECONDARY NEUTRAL MASS SPECTROMETRY (SNMS); TUNGSTEN OXIDE;

GAS PERMEABLE MEMBRANES;

EID: 0039425212     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00564-7     Document Type: Article

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