Titanium suicide formation in TiSi2/TiB2 bilayer barrier structure

Microelectronic Engineering

Volumn 33, Issue 1-4, 1997, Pages 317-323

  Sade, G ^a   Pelleg, J ^a   Ezersky, V ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

Diffusion barrier; Sputtering; Titanium boride; Titanium suicide

Indexed keywords

EID: 0039384478     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-9317(96)00060-3     Document Type: Article

References (23)

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