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Volumn 43, Issue 10, 2000, Pages 79-90

The reasonably good status of 300mm wafer-processing tools

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0039329884     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (2)

References (5)
  • 2
    • 19444366789 scopus 로고    scopus 로고
    • See http:www.sematech.org/public/resources/300mm/index.htm.
  • 3
    • 19444379089 scopus 로고    scopus 로고
    • Version 5 of the CIM GJG document is available at the SEMATECH web site www.sematech.org/public/docubase/document/3534deng.pdf.
  • 4
    • 19444365968 scopus 로고    scopus 로고
    • Selete overview of 300mm program (Phase 1) and new programs
    • SEMICON/West
    • H. Miyatake, Selete overview of 300mm program (Phase 1) and new programs, presented at SEMI Technical Programs, SEMICON/West 2000.
    • (2000) SEMI Technical Programs
    • Miyatake, H.1
  • 5
    • 19444382825 scopus 로고    scopus 로고
    • July 10, SEMI, Rob Leachman's talk, "Understanding Fab Economics."
    • STEP: Quantifying Equipment Productivity - The SEMI E79 Standard, July 10, 2000, SEMI, Rob Leachman's talk, "Understanding Fab Economics." Also see www.euler.berkeley.edu/esrc/csm.
    • (2000) Quantifying Equipment Productivity - The SEMI E79 Standard


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.