Study of photoelectrocatalytic degradation of sulfosalicylic acid

Chinese Journal of Catalysis

Volumn 21, Issue 3, 2000, Pages 212-

  Liu, Hong ^a   Leng, Wenhua ^b   Wu, Hejin ^a   Cheng, Shaoan ^b   Wu, Ming ^a   Zhang, Jianqing ^b   Li, Wenzhao ^a   Cao, Chunan ^b  

^a DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Degradation; Photoelectrocatalysis; Porous nickel; Sulfosalicylic acid; Titanium dioxide

Indexed keywords

EID: 0039302011     PISSN: 02539837     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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