A 100 kV electron gun for the x-ray mask writer, EB-X2

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6435-6439

  Saito, Kenichi ^a   Kato, Junichi ^a   Shimazu, Nobuo ^a   Shimizu, Akira ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Electron beam lithography; Electron optical system; Ray tracing program; Thermal emission electron gun; X ray mask

Indexed keywords

EID: 0039227366     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6435     Document Type: Article

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