Stochastic Coulomb interactions in ion projection lithography systems with aberration-broadened crossover

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2369-2372

  Kruit, P ^a   Barth, J E ^a   Lammer, G ^b   Chalupka, A ^b   Vonach, H ^b   Loschner H ^b   Stengl, G ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Ion Microfabrication Systems GmbH   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039223816     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589649     Document Type: Article

References (9)

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5. E. Hammel et al., J. Vac. Sci. Technol. B 12, 3533 (1994).
6. G. H. Jansen, Coulomb Interactions in Particle Beams, Advances in Electronics and Electron Physics, Suppl. 21 (Academic, New York, 1990).
7. K. H. Loeffler and R. H. Hudgin, Proc. 7th Int. Conf. Electron. Microsc. 2, 67 (1970).
8. G. H. Jansen (unpublished).
9. G. H. Jansen, MONTEC Monte Carlo Simulation Program, distributed by Delft Particle Optics Foundation, Delft University of Technology (1988).