Alkyl phenylglyoxylates as radical photoinitiators creating negative photoimages

Journal of Materials Chemistry

Volumn 7, Issue 9, 1997, Pages 1737-1740

  Hu, Shengkui ^a   Neckers, Douglas C ^a  

^a BOWLING GREEN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039075382     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a701797i     Document Type: Article

References (26)

1. W. S. Deforest, Photoresist: Materials and Process, McGraw-Hill, New York, 1975.
2. G. Moad, D. H. Soloman, The Chemistry of Free Radical Polymerization, Elsevier Science Ltd, Amsterdam, 1995.
3. (a) S. P. Pappas, UV Curing: Science and Technology, Vol. 2, Technology Marketing Corp., CO, 1985;
4. (b) N. W. Allen, Photopolymerization and Photoimaging Science and Technology, Elsevier Science Ltd., Amsterdam, 1989.
5. (a) S. Hu and D. C. Neckers, J. Org. Chem., 1996, 61, 6407;
6. (b) E. S. Huyser and D. C. Neckers, J. Org. Chem., 1964, 29, 276;
7. (c) A. Schönberg; N. Latif; R. Moubasher and A. Sina, J. Chem. Soc., 1951, 1364;
8. (d) M. W. Encinas; E. A. Lissi; A. Zanocco; L. C. Stewart and J. C. Scaiano, Can J. Chem., 1984, 62, 386;
9. (e) P. A. Leermakers, P. C. Warren and G. F. Vesley, J. Am. Chem. Soc., 1964, 86, 1768;
10. (f) R. J. Tepper, M. C. Pirrung, J. Org. Chem., 1995, 60, 2461.
11. H. Aoyama, M. Sakamoto, K. Yoshida and Y. Omote, J. Heterocycl. Chem., 1983, 20, 1099.
12. W. E. Ford and M. A. J. Rodgers, J. Phys. Chem., 1994, 98, 3822.
13. A. Torres-Filho and D. C. Neckers, J. Appl. Polym. Sci., 1994, 51, 931.
14. W. F. Jager, A. A. Volkers and D. C. Neckers, Macromolecules, 1995, 28, 8153.
15. R. Popielarz and D. C. Neckers, RadTech '96 North America UV/EB Conference Proc., Nashville, TN, 1996. pp. 271-277.
16. R. S. Davidson, J. Photochem. Photobiol. A: Chem., 1993, 69, 263.
17. S. N. Gupta; L. Thijs and D. C. Neckers, J. Polym. Sci., Polym. Chem. Ed., 1981, 19, 855.
18. I. Gupta, S. N. Gupta and D. C. Neckers, J. Polym. Sci., Polym. Chem. Ed., 1982, 20, 147.
19. S. Hu, A. Mejiritski and D. C. Neckers, Chem. Mater., submitted.
20. s have been reported, see L. F. Thompson; C. G. Willson and M. J. Bowden, Introduction to Microlithography, 2nd edn., ACS Professional Reference Book, American Chemical Society, Washington DC, 1994.
21. S. A. McDonald, C. G. Willson and J. M. J. Fréchet, Acc. Chem. Res., 1994, 27, 151.
22. S. Hu and D. C. Neckers, J. Org. Chem., 1997, 62, 564.
23. S. Hu and D. C. Neckers, J. Am. Chem. Soc., submitted.
24. M. Kojima, H. Sakuragi and K. Tokumaru, Bull. Chem. Soc. Jpn., 1985, 58, 521.
25. D. Rehm and A. Weller, Isr. J. Chem., 1970, 8, 259.
26. S. L. Murov, Handbook of Photochemistry, Marcel Dekker, New York, 1973.