Measurement of copper-dependent oxidative DNA damage by HOCl and H2O2 with the ethidium-binding assay

Journal of Biochemical and Biophysical Methods

Volumn 32, Issue 2, 1996, Pages 125-135

  Prütz, Walter A ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

DNA damage by HOCl; Ethidium binding assay; Fenton reaction; Free radical damage to DNA; Hydrogen peroxide; Hypochlorous acid

Indexed keywords

COPPER; DNA; ETHIDIUM BROMIDE; FREE RADICAL; HYDROGEN PEROXIDE; HYPOCHLOROUS ACID;

ARTICLE; DNA DAMAGE; DNA DEGRADATION; INTERCALATION COMPLEX; OXIDATION; PRIORITY JOURNAL; REACTION ANALYSIS;

EID: 0039062286     PISSN: 0165022X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0165-022X(96)00006-1     Document Type: Article

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