Microwave plasma enhanced low pressure D.C. sputtering of copper films

Czechoslovak Journal of Physics

Volumn 46, Issue 4, 1996, Pages 353-368

  Musil, J ^a   Misina M ^a   Cepera M ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b Military Technical Institute of Protection   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038975841     PISSN: 00114626     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF01691694     Document Type: Article

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