메뉴 건너뛰기




Volumn 123, Issue 1, 2001, Pages 64-69

Erratum: Development of Glass-Free Metal Electrically Conductive Thick Films (ASME J. Electron. Packag. (2022) 123:1 (64-69) DOI: 10.1115/1.1329131);Development of glass-free metal electrically conductive thick films

Author keywords

Electrical; Glass; Metal; Paste; Resistivity; Thick Film

Indexed keywords


EID: 0038843790     PISSN: 10437398     EISSN: 15289044     Source Type: Journal    
DOI: 10.1115/1.1371772     Document Type: Erratum
Times cited : (6)

References (19)
  • 1
    • 0031221659 scopus 로고    scopus 로고
    • Adhesion strength of silver thick-film conductors by solder-free test
    • Enokido, Y., and Yamaguchi, T., 1997, "Adhesion Strength of Silver Thick-Film Conductors by Solder-Free Test," J. Mater. Sci., 32, No. 18, pp. 4967-4971.
    • (1997) J. Mater. Sci. , vol.32 , Issue.18 , pp. 4967-4971
    • Enokido, Y.1    Yamaguchi, T.2
  • 3
    • 0029515838 scopus 로고
    • Thermal characterization of electronic devices with boundary condition independent compact models
    • Lasance, C. J. M., Vinke, H., and Rosten, H., 1995, "Thermal Characterization of Electronic Devices With Boundary Condition Independent Compact Models," IEEE Trans. Comp., Packag., Manufact. Technol., Part A, 18, pp. 1-9.
    • (1995) IEEE Trans. Comp., Packag., Manufact. Technol., Part A , vol.18 , pp. 1-9
    • Lasance, C.J.M.1    Vinke, H.2    Rosten, H.3
  • 4
    • 51249164312 scopus 로고
    • Active brazing alloy paste as a totally metal thick film conductor material
    • Zhu, M., and Chung, D. D. L., 1994, "Active Brazing Alloy Paste as a Totally Metal Thick Film Conductor Material," J. Electron. Mater., 23, No. 6, pp. 541-549.
    • (1994) J. Electron. Mater. , vol.23 , Issue.6 , pp. 541-549
    • Zhu, M.1    Chung, D.D.L.2
  • 5
    • 0038890825 scopus 로고
    • Microstructural characterization of cofired tungsten-metallized high-alumina electronic substrates
    • Behrens, G., and Heuer, A.H., 1992, "Microstructural Characterization of Cofired Tungsten-Metallized High-Alumina Electronic Substrates," J. Am. Ceram. Soc., 75, No. 10, pp. 2815-2824.
    • (1992) J. Am. Ceram. Soc. , vol.75 , Issue.10 , pp. 2815-2824
    • Behrens, G.1    Heuer, A.H.2
  • 6
    • 84985097650 scopus 로고
    • Structure and bond strength of a copper-alumina interface
    • Yoshino, Y., and Shibata, T., 1992, "Structure and Bond Strength of a Copper-Alumina Interface," J. Am. Ceram. Soc. 75, No. 10, pp. 2756-2760.
    • (1992) J. Am. Ceram. Soc. , vol.75 , Issue.10 , pp. 2756-2760
    • Yoshino, Y.1    Shibata, T.2
  • 7
    • 0015651290 scopus 로고
    • Effect of oxygen on the reaction between copper and sapphire
    • O'Brien, T. E., and Chaklader, A. C. D., 1974, "Effect of Oxygen on the Reaction Between Copper and Sapphire," J. Am. Ceram. Soc. 57, No. 8, pp. 329-332.
    • (1974) J. Am. Ceram. Soc. , vol.57 , Issue.8 , pp. 329-332
    • O'Brien, T.E.1    Chaklader, A.C.D.2
  • 8
    • 0031095241 scopus 로고    scopus 로고
    • Transient liquid-phase bonding of alumina and metal matrix composite base materials
    • Zhai, Y., North, T. H., and Serrato-Rodrigues, J., 1997, "Transient Liquid-Phase Bonding of Alumina and Metal Matrix Composite Base Materials," J. Mater. Sci., B 32, No. 6, pp. 1393-1397.
    • (1997) J. Mater. Sci., B , vol.32 , Issue.6 , pp. 1393-1397
    • Zhai, Y.1    North, T.H.2    Serrato-Rodrigues, J.3
  • 9
    • 0024714075 scopus 로고
    • Role of oxygen in bonding copper to alumina
    • Yoshino, Y., 1989, "Role of Oxygen in Bonding Copper to Alumina," J. Am. Ceram. Soc. 72, No. 8, pp. 1322-1327.
    • (1989) J. Am. Ceram. Soc. , vol.72 , Issue.8 , pp. 1322-1327
    • Yoshino, Y.1
  • 10
    • 0028518582 scopus 로고
    • Low temperature routes to joining ceramics for high-temperature applications
    • Dalgleish, B. J., Tomsia, A. P., Nakashima, K., Iocatelli, M. R., and Glaeser, A. M., 1994, "Low Temperature Routes to Joining Ceramics for High-Temperature Applications," Scr. Metall. Mater., 31, No. 8, pp. 1043-1048.
    • (1994) Scr. Metall. Mater. , vol.31 , Issue.8 , pp. 1043-1048
    • Dalgleish, B.J.1    Tomsia, A.P.2    Nakashima, K.3    Iocatelli, M.R.4    Glaeser, A.M.5
  • 11
    • 0030261693 scopus 로고    scopus 로고
    • Effects of oxide additives on sheet resistance of W thick-film conductor
    • Liang, T., Sun, W., Wang, Y. H., Li, H. D., Wu, Q. L., and Yan, Y. J., 1996, "Effects of Oxide Additives on Sheet Resistance of W Thick-Film Conductor," J. Mater. Sci., 31, No. 19, pp. 5159-5161.
    • (1996) J. Mater. Sci. , vol.31 , Issue.19 , pp. 5159-5161
    • Liang, T.1    Sun, W.2    Wang, Y.H.3    Li, H.D.4    Wu, Q.L.5    Yan, Y.J.6
  • 12
    • 0031233355 scopus 로고    scopus 로고
    • Bonding behavior of Cu/CuO thick film on a low-firing ceramic substrate
    • Lee, S. J., Kriven, W. M., Park, J. H., and Yoon, Y. S., 1997, "Bonding Behavior of Cu/CuO Thick Film on a Low-Firing Ceramic Substrate," J. Mater. Res., 12, No. 9, pp. 2411-2418.
    • (1997) J. Mater. Res. , vol.12 , Issue.9 , pp. 2411-2418
    • Lee, S.J.1    Kriven, W.M.2    Park, J.H.3    Yoon, Y.S.4
  • 13
    • 0031681982 scopus 로고    scopus 로고
    • Development of a surface-treatment method for AIN substrates to improve adhesion with thick-film conductors
    • Kuromitsu, Y., Nagase, T., Yoshida, H., and Morinaga, K., 1998, "Development of a Surface-Treatment Method for AIN Substrates to Improve Adhesion With Thick-Film Conductors," J. Adhes. Sci. Technol., 12, No. 1, pp. 105-119.
    • (1998) J. Adhes. Sci. Technol. , vol.12 , Issue.1 , pp. 105-119
    • Kuromitsu, Y.1    Nagase, T.2    Yoshida, H.3    Morinaga, K.4
  • 15
    • 0025462972 scopus 로고
    • Microstructure at the interface between AIN and a Ag-Cu-Ti braze alloy
    • Carim, A. H., and Loehmann, R. E., 1990, "Microstructure at the Interface between AIN and a Ag-Cu-Ti Braze Alloy," J. Mater. Res., 5, No. 7, pp. 1520-1529.
    • (1990) J. Mater. Res. , vol.5 , Issue.7 , pp. 1520-1529
    • Carim, A.H.1    Loehmann, R.E.2
  • 16
    • 0032183384 scopus 로고    scopus 로고
    • Development of glass frit free metallization systems for AIN
    • Adlaβnig, A., Schuster, J. C., Reicher, R., and Smetana, W., 1998, "Development of Glass Frit Free Metallization Systems for AIN," J. Mater. Sci., 33, No. 20, pp. 4887-4892.
    • (1998) J. Mater. Sci. , vol.33 , Issue.20 , pp. 4887-4892
    • Adlaßnig, A.1    Schuster, J.C.2    Reicher, R.3    Smetana, W.4
  • 17
    • 0032281518 scopus 로고    scopus 로고
    • Bonding mechanism and stress distribution of a glass frit free thick film metallization for AIN-Ceramic
    • Reicher, R., Smetana, W., Gruber, E. U., and Schuster, J. C., 1998, "Bonding Mechanism and Stress Distribution of a Glass Frit Free Thick Film Metallization for AIN-Ceramic," J. Mater. Sci.: Mater. Electron., 9, No. 6, pp. 429-434.
    • (1998) J. Mater. Sci.: Mater. Electron. , vol.9 , Issue.6 , pp. 429-434
    • Reicher, R.1    Smetana, W.2    Gruber, E.U.3    Schuster, J.C.4
  • 19
    • 0022735473 scopus 로고
    • Effects of tin ion and nitrogen ion implantation on the oxidation of titanium
    • Madakson, P., 1987, "Effects of Tin Ion and Nitrogen Ion Implantation on the Oxidation of Titanium," Mater. Sci. Eng., 90, pp. 205-212.
    • (1987) Mater. Sci. Eng. , vol.90 , pp. 205-212
    • Madakson, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.