Thermal transport properties of gold-covered thin-film silicon dioxide

IEEE Transactions on Components and Packaging Technologies

Volumn 26, Issue 1, 2003, Pages 80-88

  Burzo, Mihai G ^a   Komarov, Pavel L ^a   Raad, Peter E ^a  

^a Southern Methodist University   (United States)

Author keywords

Interface resistance; Ion beam sputtered oxide; Laser based; Noninvasive; Thermal conductivity measurement; Thermally grown oxide; Transient thermo reflectance

Indexed keywords

FILM GROWTH; GOLD; HEAT RESISTANCE; INTERFACES (MATERIALS); LASER APPLICATIONS; NONDESTRUCTIVE EXAMINATION; SILICA; SPUTTERING; THERMAL CONDUCTIVITY OF SOLIDS; THERMAL VARIABLES MEASUREMENT; TRANSIENTS;

GOLD COVERED THIN FILM; INTERFACE RESISTANCE; INTRINSIC THERMAL CONDUCTIVITY; ION BEAM SPUTTERED OXIDES; THERMAL CONDUCTIVITY MEASUREMENT; THERMAL INTERFACE RESISTANCE; THERMALLY GROWN OXIDE; THIN FILM SILICON DIOXIDE; TRANSIENT THERMO REFLECTANCE SYSTEM;

THIN FILM DEVICES;

EID: 0038819132     PISSN: 15213331     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCAPT.2003.811467     Document Type: Article

References (37)

1. P. Lall, M. G. Pecht, and E. B. Hakim, Influence of Temperature on Microelectronics and System Reliability. Orlando, FL: CRC, 1997.
2. P. Lall, M. Pecht, and E. Hakim, "Characterization of functional relationship between temperature and microelectronic reliability," Microelectron. Rel., vol. 35, pp. 377-402, 1995.
3. L. T. Yen, "Review of heat transfer technologies in electronic equipment," ASME J. Electron. Packag., vol. 117, pp. 333-339, 1995.
4. K. Goodson and M. Flik, "Effect of microscale thermal conduction of the packing limit of silicon-on-insulator electronic devices," IEEE Trans. Comp., Hybrids, Manufact. Technol., vol. 15, pp. 715-722, 1992.
5. D. G. Cahill, H. E. Fischer, T. Klitsner, E. T. Swartz, and R. O. Pohl, "Thermal conductivity of thin films: Measurements and understanding," J. Vacuum Sci. Technol. A, vol. 7, pp. 1259-1266, 1989.
6. J. C. Lambropoulos and S. S. Hwang, "Thermal properties of thin films," in Proc. Mater. Res. Soc. Symp., vol. 284, 1993, pp. 133-138.
7. K. E. Goodson and M. I. Flik, "Solid layer thermal-conductivity measurement techniques," ASME Appl. Mech. Rev., vol. 47, pp. 101-112, 1994.
8. D. L. Decker, L. G. Koshigoe, and E. J. Ashley, "Thermal properties of optical thin film materials," Government Printing Office, Washington DC, NBS Special Publication 727, Laser Induced Damage in Optical Materials, p. 291, 1986.
9. 2 films," Thin Solid Films, vol. 207, pp. 197-201, 1992.
10. O. W. Kading, H. Skurk, and K. E. Goodson, "Thermal conduction in metallized silicon-dioxide layers on silicon," Appl. Phys. Lett., vol. 65, pp. 1629-1631, 1994.
11. A. J. Griffin, F. R. Brotzen, and P. J. Loos, "The transverse thermal conductivity of thin dielectric films," High Temp. Mater. Sci., vol. 33, pp. 217-224, 1995.
12. J. C. Lambropoulos, S. D. Jacobs, S. J. Burns, L. Shaw-Klein, and S. S. Hwang, "Thermal conductivity of thin films: Measurement and microstructural effects," in Thin Film Heat Transfer: Properties and Processing, M. K. Alam et al., Eds. New York: ASME HTD, 1991, vol. 184, pp. 21-32.
13. H. A. Schafft, J. S. Suchle, and P. G. A. Mirel, "Thermal conductivity measurements of thin-film silicon dioxide," in Proc. IEEE Int. Conf. Microelectron. Test Structures, vol. 2, 1989, pp. 121-124.
14. M. S. Love and A. C. Anderson, "Estimate of phonon thermal transport in amorphous materials above 50K," Phys. Rev. B, vol. 42, pp. 1845-1847, 1990.
15. K. E. Goodson, M. I. Flik, L. T. Su, and D. A. Antoniadis, "Prediction and measurement of thermal conductivity of amorphous dielectric layers," J. Heat Transfer, vol. 116, pp. 317-323, 1994.
16. E. T. Swartz and R. O. Pohl, "Thermal resistance at interfaces," Appl. Phys. Lett., vol. 51, pp. 2200-2202, 1987.
17. A. Bejan, Convection Heat Transfer. New York: Wiley, 1995.
18. Y. S. Ju and K. E. Goodson, "Process-dependent thermal transport properties of silicon-dioxide films deposited using low-pressure chemical vapor deposition," J. Appl. Phys., vol. 85, pp. 7130-7134, 1999.
19. M. Rhode, "Photoacoustic characterization of thermal transport properties in thin films and microstructure," Thin Solid Films, vol. 238, pp. 199-206, 1994.
20. D. L. Decker, L. G. Koshigoe, and E. J. Ashley, "Thermal properties of optical thin film materials," NBS, Spec. Publ., vol. 727, pp. 291-297, 1986.
21. M. G. Burzo, P. L. Komarov, and P. E. Raad, "Influence of the metallic absorption layer on the quality of thermal conductivity measurements by the transient thermo-reflectance method," Microelectron. J., vol. 33, pp. 697-703, 2002.
22. ____, "A study of the effect of surface metallization on thermal conductivity measurements by the transient thermo-reflectance method," J. Heat Transfer, vol. 124, pp. 1009-1018, 2002.
23. T. Q. Qiu and C. L. Tien, "Short-pulse laser heating on metals," Int. J. Heat Mass Transfer, vol. 35, pp. 719-726, 1992.
24. J. M. Ziman, Electrons and Phonons; The Theory of transport phenomena in solids. Oxford, UK: Oxford Univ. Press, 1960, ch. 8 and 9.
25. A. Majumdar, "Microscale heat conduction in dielectric thin films," ASME J. Heat Transfer, vol. 115, pp. 7-16, 1993.
26. G. A. Slack, F. Seutz, and A. G. Turball, "The thermal conductivity of nonmetallic crystals," in Solid State Phys., New York: Academic, 1979, vol. 34, pp. 1-71 (see p. 57).
27. M. I. Flik, B. L. Choi, and K. E. Goodson, "Heat transfer regimes in microstructures," J. Heat Transfer, vol. 114, pp. 666-674, 1992.
28. C. Kittel, Introduction to Solid State Physics. New York: Wiley, 1986, ch. 17.
29. A. Sugawara, "Precise determination of high purity fused quartz from 0 to 650 °C," Physica, vol. 41, pp. 515-521, 1969.
30. Y. S. Toulukian and E. H. Buyco, "Specific heat: Nonmetallic solids," in Thermophysical Properties of Matter. New York: IFI/Plenum, 1970, vol. 5.
31. D. G. Cahill, "Heat transport in dielectric thin films and at solid-solid interfaces," in Microscle Energy Transport, C. L. Tien, A. Majumdar, and F. Gerner, Eds: Taylor & Francis, 1998, ch. 2, sec. 2-3-3, pp. 108-109.
32. K. E. Goodson, M. I. Flik, L. T. Su, and D. A. Antoniadis, "Annealing-temperature dependence of the thermal conductivity of LPCVD silicon-dioxide layers," IEEE Electron Device Lett., vol. 14, pp. 490-492, 1993.
33. D. G. Cahill and R. O. Pohl, "Lattice vibration and heat transport in crystals and glasses," Annu. Rev. Phys. Chem., vol. 39, pp. 93-12, 1988.
34. ____, "Heat flow and lattice vibration in glasses," Solid State Commun., vol. 70, pp. 927-930, 1989.
35. S. J. Kline and F. A. McClintock, "Describing uncertainties in single-sample experiments," Mech. Eng., p. 3, 1953.
36. J. P. Holman, Experimental Methods for Engineers, 6th ed. New York: McGraw-Hill, 1994, ch. 3, pp. 49-65.
37. 2 films deposited on silicon," in Proc. Mater. Res. Soc. Symp., vol. 516, 1998, pp. 51-56.