Electrical control of the reflectance of porous silicon layers

Journal of Porous Materials

Volumn 7, Issue 1, 2000, Pages 205-208

  Thonissen M ^a   Marso, M ^a   Arens Fischer, R ^a   Hunkel, D ^a   Kruger M ^a   Ganse, V ^a   Luth H ^a   Theiss W ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; LIGHT REFLECTION; LIQUID CRYSTALS; OPTICAL FILMS; OPTICAL MULTILAYERS; OPTICAL VARIABLES CONTROL; OXIDATION;

REFLECTANCE CONTROL;

POROUS SILICON;

EID: 0038818808     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1009642922253     Document Type: Article

References (10)

1. M. Krüger, M.G. Berger, M. Thönissen, R. Arens-Fischer, and H. Lüth, Patent submission, DE: P 196 08 428.8-52 (28.02.1996) and PCX: DE 96/00913 (20.05.1996).
2. M. Krüger, Ph.D. Thesis, RWTH Aachen, Germany, 1998.
3. M. Thönissen, M.G. Berger, M. Krüger, R. Arens-Fischer, and H. Lüth, patent submission, DE: P 196 22 748.8-51 (05.06.1996) and PCX: DE 97/01117 (30.05.1997).
4. J.W. Doane et al., Appl. Phys. Lett 48, 269 (1986).
5. Merck Ltd., Liquid Crystal Mixtures (1994).
6. Nematel GmbH, Mainz, Germany, private communication (Dr. Eidenschink).
7. M. Thönissen, Ph.D. Thesis, RWTH Aachen, 1998.
8. H. Binder, H. Schmiedel, G. Lantzsch, C. Cramer, and G. Klose, Liquid Crystals 21, 415 (1996).
9. H. Schmiedel, R. Stannarius, G. Feller, and C. Cramer, Zeitschr. f. physik. Chemie 190, 135 (1995).
10. G. Amato, C. Delerue, and H.-J. von Bardeleben, (Eds.), Structural and Optical Properties of Porous Silicon Nanostrucures (Gordon and Breach Science Publishers, 1997).