Micromachining applications of a high resolution ultrathick photoresist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 6, 1995, Pages 3012-3016

  Lee, K Y ^a   LaBianca, N ^a   Rishton, S A ^a   Zolgharnain, S ^a   Gelorme, J D ^a   Shaw, J ^a   Chang, T H P ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CARBON INORGANIC COMPOUNDS; ELECTRODES; ELECTROPLATING; GOLD; MICROMACHINING; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SULFUR COMPOUNDS;

ELECTRON MICROCOLUMNS; MICROOCTAPOLE DEFLECTORS; SULFUR HEXAFLUORIDE; ULTRATHICK LAYERS; ULTRAVIOLET LITHOGRAPHY; VERTICAL SIDEWALLS;

PHOTORESISTS;

EID: 0038798179     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588297     Document Type: Article

References (8)