Novel approaches to reduce substrate dependency of DUV chemically amplified photoresist

Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 445-450

  Chun, Jun Sung ^a,b   Bok, Cheol Kyu ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

^b ASM Lithography   (South Korea)

Author keywords

Acid treatment; Dehydration; Resist scum foot; Substrate dependency

Indexed keywords

EID: 0038769356     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.445     Document Type: Article

References (6)

1. J. C. Vigil et al., Proc. SPIE 2438, p. 628(1995)
2. O. Nalmasu et al., J. Vac. Sci. Technol. 1310(6), p. 2536 (1992)
3. H. Ito et al., Proc. SPIE 1925, p. 65(1993)
4. A. Usujima et al., Proc. SPIE 2438, p. 529(1995)
5. K. R. Dean et al., Proc. SPIE 2438, p. 514(1995)
6. th international symphosium for testing & failure analysis, LA, CA, p. 259, 17-23 oct, (1992)