The electrostatic sheath in a dusty plasma

Physics of Plasmas

Volumn 7, Issue 7, 2000, Pages 3093-3096

  Wang, Xiaogang ^a   Bhattacharjee, A ^a  

^a UNIVERSITY OF IOWA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038763949     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.874164     Document Type: Article

References (11)

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2. T. Nitter, Plasma Sources Sci. Technol. 5, 93 (1996).
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4. H. Luo and M. Y. Yu, Phys. Rev. E 56, 1270 (1997).
5. V. N. Tsytovich, S. V. Vladimirov, and S. Benkadda, Phys. Plasmas 6. 2972 (1999).
6. C. O. Thompson, N. D'Angelo, and R. L. Merlino, Phys. Plasmas 6, 1421 (1999).
7. D. Samsonov and J. Goree, Phys. Rev. E 59, 1047 (1999).
8. G. E. Morfill, H. M. Thomas, U. Konopka, H. Rothermel, M. Zuzic, A. Ivlev, and J. Coree, Phys. Rev. Lett. 83, 1598 (1999).
9. J. Goree, G. E. Morfill, V. N. Tsytovich, and S. V. Vladimirov, Phys. Rev. E 59, 7055 (1999).
10. N. D'Angelo and R. L. Merlino (private communication).
11. See, for instance, M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Material Processing (Wiley, New York. 1994). p. 154.