Stress in mutual diffusion

Defect and Diffusion Forum

Volumn 216-217, Issue , 2003, Pages 13-18

  Szabo I A ^a   Opposits, G ^b   Beke, D L ^a  

^a UNIVERSITY OF DEBRECEN   (Hungary)

^b SEMILAB SEMICONDUCTOR PHYSICS LABORATORY CO LTD   (Hungary)

Author keywords

Mutual diffusion; Numerical simulation; Phase growth; Stress effects; Thin sheets

Indexed keywords

COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; MATHEMATICAL MODELS; SHEET METAL; STRESSES; TRANSPORT PROPERTIES;

CONVECTIVE MATTER TRANSPORT; CYLINDRICALLY BENT DIFFUSION COUPLES; MATERIAL TRANSPORT; MUTUAL DIFFUSION; PHASE GROWTH; PLANAR BENT DIFFUSION COUPLES; STRESS DEVELOPMENT; STRESS EFFECTS; THIN SHEETS;

DIFFUSION IN SOLIDS;

EID: 0038741747     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.216-217.13     Document Type: Article

References (4)

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2. G. Opposits, S. Szabo, D.L. Beke, Z. Guba, and I.A. Szabo: Scripta Mater. Vol. 39 (1998), p. 977
3. D. W. Stevens and G.W. Powell: Met. Trans. A Vol. 8A (1977), p. 1531
4. I. Daruka, I.A. Szabó, D.L. Beke, Cs. Cserháti, A. Kodentsov and F.J.J. van Loo: Acta Mater. Vol. 12 (1997), p. 4981