Development of a new 1 × 4 micro optical switch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4755, Issue , 2002, Pages 544-548

  Wang, Z F ^a   Shan, X C ^a   Wang, Z P ^a   Lim, S P ^b   Lee, K H ^b   Noell, W ^c   De Rooij, Nico ^c  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Deep reactive ion etching (DRIE); Fiber optical switch; Micro optical electro mechanical system (MOEMS); Silicon on insulator (SOI)

Indexed keywords

ELECTROSTATIC ACTUATORS; FABRICATION; LITHOGRAPHY; MICROMACHINING; MICROOPTICS; MIRRORS; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY; SINGLE MODE FIBERS; SUBSTRATES;

MICRO-OPTICAL-ELECTRO-MECHANICAL SYSTEM (MOEMS);

OPTICAL SWITCHES;

EID: 0038741057     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.462854     Document Type: Article

References (8)

1. Surface-micromachined free-space fiber optic switches with integrated microacuators for optical fiber communication systems
2. Ali-optical networks need optical switches
3. Micromachining for optical and optoelectronic systems
4. Electrostatic micro torsion minors for an optical switch matrix
5. Vertical mirrors fabricated by deep reactive ion etching for fiber-optic switching applications
6. Micro-opto-mechanical 2 × 2 switch for single-mode fibers based on plasma-etched silicon mirror and electrostatic actuation
7. The black silicon method VI, high aspect ratio trench etching for MEMS applications