Determination of chloride and sulfate in semiconductor-grade etchants comprised of acetic acid, nitric acid and phosphoric acid

Journal of Chromatography A

Volumn 997, Issue 1-2, 2003, Pages 269-278

  Vanatta, L E ^a   Coleman, D E ^b   Woodruff, A ^c  

^a AIR LIQUIDE   (France)

^b ALCOA TECHNICAL CENTER   (United States)

^c DIONEX CORPORATION   (United States)

Author keywords

Acetic acid; Chloride; Etchants; Experimental design; Inorganic anions; Nitric acid; Phosphoric acids; Statistical analysis; Sulfate

Indexed keywords

ACETIC ACID; CALIBRATION; INORGANIC ACIDS; SEPARATION;

FLOW-RATES;

COLUMN CHROMATOGRAPHY;

ACETIC ACID; CHLORIDE; NITRIC ACID; PHOSPHORIC ACID; POTASSIUM HYDROXIDE; SULFATE;

CALIBRATION; CHEMICAL ANALYSIS; CHEMICAL COMPOSITION; COLUMN CHROMATOGRAPHY; CONFERENCE PAPER; CONFIDENCE INTERVAL; FLOW RATE; LOW TEMPERATURE; PREDICTION; PRIORITY JOURNAL; SAMPLE; SEMICONDUCTOR;

EID: 0038697744     PISSN: 00219673     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0021-9673(03)00632-0     Document Type: Conference Paper

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