Batch processing of CMOS compatible feedthroughs

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 487-494

  Rasmussen, F E ^a   Heschel, M ^a   Hansen, O ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Batch processing; CMOS compatible; Electrical feedthrough; Electrodeposited photoresist; KOH resistant PECVD nitride

Indexed keywords

DIELECTRIC MATERIALS; ELECTRODEPOSITION; ELECTRONICS PACKAGING; ETCHING; PHOTORESISTS; SILICON WAFERS; SPUTTER DEPOSITION;

ELECTRICAL FEEDTHROUGH;

CMOS INTEGRATED CIRCUITS;

EID: 0038696525     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00105-9     Document Type: Conference Paper

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