Effects of applied DC/AC fields in electrical fixing process with SBN:60

Applied Physics B: Lasers and Optics

Volumn 76, Issue 5, 2003, Pages 547-554

  Thompson, A ^a   Nazhestkina, N ^a   Siahmakoun, A ^a   Duree, G ^a   Roesler, N ^a  

^a ROSE HULMAN INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DIFFRACTION GRATINGS; ELECTRIC FIELD EFFECTS; FATIGUE OF MATERIALS; HOLOGRAMS; HYSTERESIS; LASER PULSES; OPTICAL MATERIALS; X RAY DIFFRACTION ANALYSIS;

CRYSTAL FATIGUE; DIFFRACTION EFFICIENCY; ELECTRICAL FIXING TECHNIQUES; ELECTRICALLY FIXED PHOTOREFRACTIVE GRATINGS; HYSTERESIS LOOP; POLARITY; WRITE REVEAL GRATING TECHNIQUE;

CESIUM COMPOUNDS;

EID: 0038684159     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-003-1145-3     Document Type: Article

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