Formation of YCrO3 thin films using radio-frequency magnetron sputtering method for a wide range thermistor application

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 2 A, 2003, Pages 575-578

  Kim, Jin Hyeok ^a   Shin, Hee Seung ^a   Kim, Sang Hun ^a   Moon, Jong Ha ^a   Lee, Byung Teak ^a  

^a Chonnam National University   (South Korea)

Author keywords

Microstructure; Sputtering; TEM; Thermistors; Thin films; YCrO3

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; MAGNETRON SPUTTERING; MIXTURES; SILICON WAFERS; TEMPERATURE; THERMISTORS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

AMOURPHOUS PHASE; CRYSTALLINITY; RADIO FREQUENCY MAGNETRON SPUTTERING METHOD; WIDE RANGE THERMISTOR;

THIN FILMS;

EID: 0038682121     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.575     Document Type: Article

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