Characteristics of selective MoSiON etching in a chlorine plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 702-712

  Chang, Byung Soo ^a   Min, Dong Soo ^a   Kwon, Hyuk Joo ^a   Choi, Boo Yeon ^a  

^a Photronics PKL   (South Korea)

Author keywords

Chlorine; MoSiON; Polymer; Selectivity

Indexed keywords

CRYSTAL DEFECTS; DRY ETCHING; MOLYBDENUM COMPOUNDS; POLYMERS; SEMICONDUCTING GLASS;

FLUORINE CONTAINING POLYMERS;

INDUCTIVELY COUPLED PLASMA;

EID: 0038642111     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467492     Document Type: Conference Paper

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