Kinetics of agglomeration of NiSi and NiSi2 phase formation

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 135-140

  Detavernier, C ^a   Ozcan A ^a   Lavoie, C ^a   Sweet, Jean Jordan ^a   Harper, J M E ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; ELECTRIC RESISTANCE; LIGHT SCATTERING; MORPHOLOGY; PHASE TRANSITIONS; REACTION KINETICS; SILICON ON INSULATOR TECHNOLOGY;

PHASE FORMATIONS;

NICKEL COMPOUNDS;

EID: 0038632170     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n4.12     Document Type: Conference Paper

References (4)

1. C. Lavoie et al., Defect and Diffusion Forum 194-199, 1477 (2001).
2. C. Lavoie et al., J. Electr. Mat. 31, 597 (2002).
3. G. B. Stephenson et al., Rev. Sci. Instrum. 60 (1989) 1537.
4. S.L. Zhang and F.M. d'Heurle, Thin Solid Films 256, 155 (1995).