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Volumn 745, Issue , 2002, Pages
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Novel materials and processes for advanced CMOS
[No Author Info available]
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
DEPOSITION;
DIELECTRIC MATERIALS;
ETCHING;
HAFNIUM COMPOUNDS;
PHASE TRANSITIONS;
PHOTORESISTS;
PLASMAS;
RUTHENIUM COMPOUNDS;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DOPING;
THERMOANALYSIS;
ULTRATHIN FILMS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZIRCONIA;
ATOMIC LAYER DEPOSITION (ALD);
CYCLIC PLASMA EXPOSURE;
EIREV;
IMPLANTED DOPANTS;
OPEN CIRCUIT POTENTIAL ANALYSIS;
OXYGEN VACANCY DEFECTS;
CMOS INTEGRATED CIRCUITS;
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EID: 0038632056
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Review |
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Times cited : (2)
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References (0)
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