Very low thermal expansion in TaO2F

Journal of Solid State Chemistry

Volumn 173, Issue 1, 2003, Pages 45-48

  Tao, J Z ^a   Sleight, A W ^a  

^a OREGON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; SILICA; THERMAL EXPANSION; X RAY DIFFRACTION ANALYSIS;

THERMAL EXPANSION COEFFICIENT;

TANTALUM COMPOUNDS;

FLUORINE DERIVATIVE; SILICON DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; TEMPERATURE DEPENDENCE; THERMAL ANALYSIS; THERMODYNAMICS; X RAY DIFFRACTION;

EID: 0038618752     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-4596(03)00077-X     Document Type: Article

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