Polyimide-based organic thin films prepared by rf magnetron sputtering

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 274-276

  Kinbara, A ^a   Hayashi, T ^a   Wakahara, K ^a   Kikuchi, N ^a   Kusano, E ^a   Nanto, H ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dielectric constant; Organic thin films; Sputtering; Surface energy

Indexed keywords

COMPOSITION; CONTACT ANGLE; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; PERMITTIVITY; POLYIMIDES; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0038615949     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00297-9     Document Type: Conference Paper

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