Unbalanced magnetrons and new sputtering systems with enhanced plasma Ionization

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 9, Issue 3, 1991, Pages 1171-1177

  Musil, J ^a   Munz W D ^b  

^a INSTITUTE OF MATHEMATICS   (Czech Republic)

^b The Netherlands ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038576097     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.577597     Document Type: Article

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