Microfabricated silicon gas chromatographic micro-channels: fabrication and performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3511, Issue , 1998, Pages 262-268

  Matzke, C M ^a   Kottenstette, R J ^a   Casalnuovo, S A ^a   Frye Mason, G C ^a   Hudson, M L ^a   Sasaki, D Y ^a   Manginell, R P ^a   Wong, C C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Deep reactive ion etch (DRIE); Gas chromatography; Gas separations; High aspect ratio Si etch (HARSE); Micro channel; Micro column; Micromachine; Open capillary; Stationary phase

Indexed keywords

GAS CHROMATOGRAPHY; MICROMACHINING; OPTIMIZATION; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON WAFERS;

GAS SEPARATIONS; MICROCHANNELS; MICROFABRICATION; SILICON GAS CHROMATOGRAPHY;

MICROELECTRONIC PROCESSING;

EID: 0038555330     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324309     Document Type: Conference Paper

References (7)

1. M. L. Hudson, R. Kottenstette, C. M. Matzke, G. C. Frye-Mason, K. A. Shollenberger, D. R. Adkins, and C. C. Wong, submitted to 1998 International Mechanical Engineering Congress and Exposition, Nov. 1998.
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4. Thick photoresist process: Spin AZ 4903 rpm, soft bake for 4 minutes on a 120°C hotplate, wait 3 hours for resist rehydration, and, after exposure, develop in AZ400 diluted 1:4 with water.
5. Licensed from Robert Bosch GmbH patent number 5501893, issued March 26, 1996.
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