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Physical Review Letters

Volumn 64, Issue 1, 1990, Pages 56-59

Diffusion of paramagnetic defects in amorphous silicon

(3) Jackson, W B a Tsai, C C a Thompson, R a

a PALO ALTO RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038551617 PISSN: 00319007 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevLett.64.56 Document Type: Article

Times cited : (21)

References (12)

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5
- 84915834770
- edited by, H. Fritzsche, World Scientific, Singapore
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- Pantelides, S.T.¹

6
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8
- 0042844251
- Fast hydrogen diffusion in amorphous silicon
- (1987) Journal of Non-Crystalline Solids , vol.97-98 , pp. 807
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9
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- (1982) J. Appl. Phys. , vol.53 , pp. 8745
- Beyer, W.¹ Wagner, H.²

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- (1978) Appl. Phys. Lett. , vol.33 , pp. 81
- Carlson, D.E.¹ Magee, C.W.²

11
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12

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.