Effect of oxidizing environments on the diffusion-segregation boron distribution in the thermal silicon dioxide-silicon system

Technical Physics

Volumn 48, Issue 5, 2003, Pages 580-586

  Aleksandrov, O V ^a   Afonin, N N ^b  

^a SAINT PETERSBURG ELECTROTECHNICAL UNIVERSITY LETI   (Russian Federation)

^b VORONEZH STATE PEDAGOGICAL UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038517119     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1576471     Document Type: Article

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