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Volumn 16, Issue 4, 2003, Pages 591-594
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Development of SSQ based 157nm photoresist
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Author keywords
157 nm lithography; Resists; Siloxane; Silsesquioxane
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Indexed keywords
MONOMER;
POLYMER;
ARTICLE;
HYDROPHILICITY;
HYDROSILYLATION;
LIGHT ABSORPTION;
LIGHT REFRACTION;
POLYMERIZATION;
PROCESS DESIGN;
RADIOSENSITIVITY;
SOLUBILITY;
TECHNOLOGY;
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EID: 0038507106
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.16.591 Document Type: Article |
Times cited : (3)
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References (5)
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