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Volumn 16, Issue 1, 2003, Pages 43-48

Conventional measurement method of film resistance of plasma-polymerized thin films using a high-resistance meter

Author keywords

Continuous wave (CW); Film resistance; Plasma polymerization; Pulse wave (Pulse); Quartz crystal microbalance (QCM)

Indexed keywords

ALLYL ALCOHOL; MONOMER; STAINLESS STEEL;

EID: 0038506844     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.43     Document Type: Article
Times cited : (3)

References (21)
  • 1
    • 0004201645 scopus 로고
    • Academic, New York Chaps. 1, 2 and 6.
    • H. Yasuda, Plasma Polymerization, Academic, New York (1985) Chaps. 1, 2 and 6.
    • (1985) Plasma Polymerization
    • Yasuda, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.