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Volumn 16, Issue 1, 2003, Pages 43-48
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Conventional measurement method of film resistance of plasma-polymerized thin films using a high-resistance meter
a,b,c a,b a,d a a a,e a b b |
Author keywords
Continuous wave (CW); Film resistance; Plasma polymerization; Pulse wave (Pulse); Quartz crystal microbalance (QCM)
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Indexed keywords
ALLYL ALCOHOL;
MONOMER;
STAINLESS STEEL;
ACCELEROMETER;
ANALYTIC METHOD;
ARTICLE;
CORRELATION ANALYSIS;
FILM;
INFRARED SPECTROSCOPY;
MATERIAL COATING;
MEASUREMENT;
POLYMERIZATION;
THICKNESS;
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EID: 0038506844
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.16.43 Document Type: Article |
Times cited : (3)
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References (21)
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