A single source approach to deposition of nickel and palladium sulfide thin films by LP-MOCVD

Materials Research Society Symposium - Proceedings

Volumn 744, Issue , 2002, Pages 219-224

  Waters, J ^a   O'Brien, P ^a   Park, J H ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NICKEL COMPOUNDS; PALLADIUM COMPOUNDS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

NICKEL SULFIDE; PALLADIUM SULFIDE; SINGLE SOURCE PRECURSORS;

THIN FILMS;

EID: 0038488299     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-744-m5.16     Document Type: Conference Paper

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