Electron production and loss processes in a spectrochemical inductively coupled argon plasma

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 58, Issue 5, 2003, Pages 783-795

  Van de Sande, M J ^a,c   Van Eck, P ^a   Sola, A ^b   Gamero, A ^b   Van der Mullen, J J A M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF CÓRDOBA   (Spain)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

ICP; Molecular argon ions; Power interruption; Thomson scattering

Indexed keywords

ARGON; DIFFUSION; MOLECULAR DYNAMICS; SPECTROSCOPIC ANALYSIS;

THOMSON SCATTERING;

INDUCTIVELY COUPLED PLASMA;

EID: 0038485656     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(03)00004-1     Document Type: Article

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