XPS study of the FCuPc/SiO2 interface

Surface Science

Volumn 532-535, Issue , 2003, Pages 976-981

  Lozzi, L ^a   Santucci, S ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

Interface states; Photoemission (total yield); Silicon oxides

Indexed keywords

ELECTRON EMISSION; FILM GROWTH; INTERFACES (MATERIALS); MONOLAYERS; PHOTOEMISSION; SURFACE REACTIONS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLECULAR FILMS;

SILICA;

EID: 0038476550     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00219-X     Document Type: Conference Paper

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